Power supply for special processes
FuG Elektronik is your strong partner when you need a power supply that is not only highly reliable but also customized. This power supply is used for plasma applications, sputtering, ion implantation, electron beam texturing, hardening, crosslinking or sterilisation, in galvanic processes and for spraying and flocking work.
A wide range of medium and high voltage applications up to electron beam evaporation can be selected for surface treatment and surface finishing process.
Medium voltage power supplies from low power up to a few hundred kW (depending on the size of the surface to be treated) are used. 120V – 3000V, 1kW – 50kW.
Electron beam sputtering/ evaporation:
High voltage power supplies with multi channel output to generate the electron beam with high power. 10kV – 80kV, 20kW – 60kW.
Medium and high voltage power supplies with high control dynamics and also high stability. 30kV – 150kV, 700W – 20kW.
Electron beam hardening/ crosslinking/ sterilisation:
High voltage power supplies with multi channel output to generate an electronic beam with high power. 50kV – 180kV, 3kW – 60kW with auxiliary power supplies.
Electron beam texturing:
High voltage power supplies with multi channel output to generate an electron beam with high power. Special version for pulsed electron beam. 30kV – 80kV, 3kW – 20kW with auxiliary power supplies.
Low voltage power supplies with current regulation and high power. 10A to 100A, up to 50V.
Robust high voltage power supplies with voltage range up to 35kV. 10kV – 50kV, up to 100mA.
Film/ foil manufacturing:
Safe arc detection partly also with arc counting. Range 10kV – 35kV, 5mA – 30mA. Connection to special customer equipment.